Diyala Journal for Pure Science DJPS

P- ISSN:2222-8373, E-ISSN:2518-9255

Volume 14, Issue 1, Part 1 , Januar y. 2018

Preparation and Characterization of SiO₂ Thin Films as an Antireflective Layer

 Ammar T. Salih, Kadhim R. Gbashi and Tawfeeq Kadhem Salman

Year: 2018, Volume: 14, Issue: 1, Part:1

Pages: 68-77 , DOI: http://dx.doi.org/10.24237/djps.1401.331C 

Language: English

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Abstract

Uniform layers of SiO₂ were prepared using thermal evaporation technique under high vacuum (10^-5 mbar). Many characterizations were investigated using these films as antireflective layers. The morphological, crystal structural and optical properties of the layers were investigated by using SEM, XRD, and UV-Vis instruments.

Keywords: thin films, thermal evaporation, SiO₂, antireflection.